主機
|
設備尺寸(寬x深x高)
|
2000 × 1200 × 1800mm
|
電源供應
|
單相AC100V 1.5kvA
|
|
安裝環境
|
23±2℅, 小於50%RH
|
|
光學系統
|
雷射
|
單獨的連續雷射器(355nm/連續雷射)
|
輸出功率
|
250mw
|
|
電源控制
|
AOM 進行電源控制
|
|
偏轉裝置
|
數位控制系統
振鏡掃描系統
|
|
光班直徑
|
∅15~∅100μm
|
|
造型
|
造型面積
|
100 × 100 × 50mm
|
對照法
|
觸變材料重塗法
|
|
層壓板厚度
|
10μm
|
main
body |
Device dimensions
(W×D×H) |
2000 × 1200 × 1800mm
|
---|---|---|
power supply
|
lsingle phase AC100V 1.5kvA
|
|
installation environment
|
23±2℅, less than50%RH
|
|
optical
system |
laser
|
Individual CW laser
(355nm/CW laser) |
output power
|
250mw
|
|
power control
|
Power control by the AOM
|
|
Deflection device
|
Digital control system
scan system of Galvanometer Mirror |
|
Spot diameter
|
∅15~∅100μm
|
|
modeling
|
modeling area
|
100 × 100 × 50mm
|
contrasting method
|
the recoating method by thixotropic material
|
|
laminate thickness
|
10μm
|